Title page for etd-0802110-122618

URN	etd-0802110-122618	Statistics	This thesis had been viewed 664 times. Download 0 times.
Author	Jui-Yang Wang
Author's Email Address	mini0941@hotmail.com
Department	Institute of Mechatronic Engineering
Year	2009	Semester	2
Degree	Master	Type of Document	Master's Thesis
Language	zh-TW.Big5 Chinese	Page Count	79
Title	Systemized Research on Nano-Oxidation Technology for Nanostructure Fabrication
Keyword	Multiple Regression Analysis PDMS AFM Nano-oxidation Si wet etching H-passivated H-passivated wet etching Si Nano-oxidation AFM PDMS Multiple Regression Analysis
Abstract	In this study, we proposed the method that is combined nano-oxidation technique by Atomic Force Microscopy (AFM) and wet etching process to make polydimethysiloxane (PDMS) nanostructure mold. And the experiment parameter includes the applied voltage, time of the applied voltage, and relative humidity during nano-oxidation, in order to understand that the experiment parameters during nano-oxidation impact on the width and height of nanostructure. The many experiments were carried out, and the fabrication database of nano-oxidation experiment is set up. And the Multiple Regression Analysis (MRA) is used, to build the multiple regression equation for height and width of nanostructure. In the influence of wet etching, it can be found that the H-passivated layer (HPL) and native oxide layer (NOL) are different after wet etching process. The height and width of nano-oxide line obviously in NOL and little increased in HPL, respectively, after nano-oxidation and wet etching process. A simple and effective reserve method static tape reserve for Si nanostructure mold was proposed in this study. In the aspect of micro/nano mold, using the silicon nanostructure by nano-oxidation as the mold, the PDMS is filled the silicon nanostructure mold to replicate the nanostructure. After the solidification, remove the silicon nanostructure mold, the PDMS nanostructure mold can be obtained. After experiment, the replication process of PDMS nanostructure mold does not destroy the silicon nanostructure mold. When comparing with the original silicon nanostructure mold, we can find that it has a very good replication capability and the variation of characteristic shape is small. Therefore, it is rational and feasible methods that combine the nano-oxidation technique and wet etching process to make PDMS nanostructure mold.
Advisor Committee	Jen-Ching Huang - advisor He ZHANG - co-chair Yu-yi LIN - co-chair
Files	etd-0802110-122618.pdf indicate not accessible
Date of Defense	2010-07-09	Date of Submission	2010-08-02

Back to Results